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Florian Loosen

Systems Engineer, High-NA EUV lithography · Zeiss SMT

Biography

Florian Loosen works at Zeiss Semiconductor Manufacturing Technology, where he focuses on high-NA EUV lithography systems and lifecycle-oriented engineering. His professional journey spans optics, applied physics and optical design, including a PhD at Friedrich-Alexander University (FAU) Erlangen-Nuremberg and the Max Planck Institute for the Science of Light (MPL). Since joining Zeiss, he’s worked across customer support, requirements engineering and system integration, including a long-term assignment at ASML in the Netherlands. Combining expertise in systems architecture, requirements engineering, project management and design thinking, he enjoys bringing together different disciplines and perspectives to solve complex challenges. Drawing on experiences from both development and operational environments, he’s passionate about turning diverse perspectives into practical solutions that create lasting impact across organizations and throughout the product lifecycle.

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